The study of argon plasma based on experimental and modeling diagnosis

Ersyzario Edo Yunata, Muhammad Ghufron

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The Argon gas is a chemical inert gas and utilizing to generate argon plasma. The Argon gas has a benefit easy to ionize and it's the cheapest of all noble gas. The Argon plasma has employed in many applications, especially for surface modification and activation process. The plasma diagnosis troughs experimental and modeling are needed with the purpose to understand the behavior of Argon plasma. The experimental diagnosis has done by varying the gas pressure and DC-bias voltage. The Langmuir probe has utilized to measure the electron and ion density of Argon plasma. The pressure variation shows the high electron density has produced in the high pressure. The DC-bias variation has also indicated the same trend with pressure variation. The high electron densities in the range 1.2 × 1017 to 1.4 × 1017 m3 have produced in the high DC-bias voltage. The high concentration of electron density increases the ionization process inside the chamber. The Optical Emission Spectroscopy (OES) has also employed to describe the population of species during the plasma generation. The Argon plasma species utilized to decide the function of Argon plasma in application process. Despite of that, the modeling software has also utilized to study argon plasma. The modeling software describes the behavior of argon plasma theoretically. The boundary of modeling process was simplified with DC-bias in-400V temperature in 400K, pressure in 30 to 70Pa. The modeling result has focuses in the effect of pressure variation. The modeling result indicates the electron density has increased in the high pressure. The modeling result and experimental diagnosis result indicates the same trend in the pressure variation. The modeling diagnosis as a theoretical utilizes to support experimental diagnosis result to describe the behavior of argon plasma.

Original languageEnglish
Title of host publication2nd International Conference on Physical Instrumentation and Advanced Materials 2019
EditorsHerri Trilaksana, Sulaiman Wadi Harun, Cameron Shearer, Moh Yasin
PublisherAmerican Institute of Physics Inc.
ISBN (Electronic)9780735440562
DOIs
Publication statusPublished - 9 Dec 2020
Event2nd International Conference on Physical Instrumentation and Advanced Materials, ICPIAM 2019 - Surabaya, Indonesia
Duration: 22 Oct 2019 → …

Publication series

NameAIP Conference Proceedings
Volume2314
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Conference

Conference2nd International Conference on Physical Instrumentation and Advanced Materials, ICPIAM 2019
Country/TerritoryIndonesia
CitySurabaya
Period22/10/19 → …

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