Micro-grooving into thick CVD diamond films via hollow-cathode oxygen plasma etching

Ersyzario Edo Yunata; Tatsuhiko Aizawa

doi:10.1016/j.mfglet.2016.05.001

Micro-grooving into thick CVD diamond films via hollow-cathode oxygen plasma etching

Ersyzario Edo Yunata, Tatsuhiko Aizawa

Research output: Contribution to journal › Article › peer-review

9 Citations (Scopus)

Abstract

Hollow-cathode oxygen plasma etching was proposed as a promising means to make micro-texturing into CVD diamond coatings. Oxygen ions and electrons were confined in the hollow-cathode to have higher ion and electron densities in the order of 10¹⁷ to 10¹⁸ m^-3 in the inside of hollow-cathode. Quantitative plasma diagnosis proved that direct reaction of oxygen atom or radicals with carbon in the diamond coating should drive the reactive ion etching (RIE) process. A diamond-coated WC (Co) disc specimen was employed to describe the RIE-behavior with aid of stainless steel mask with the line width of 100 μm. Surface depth profile measurement as well as the Raman spectroscopy demonstrated that a micro-groove was precisely etched into the diamond film as a sharp-edged profile.

Original language	English
Pages (from-to)	16-20
Number of pages	5
Journal	Manufacturing Letters
Volume	8
DOIs	https://doi.org/10.1016/j.mfglet.2016.05.001
Publication status	Published - 1 Apr 2016
Externally published	Yes

Keywords

CVD diamond coating
High etching rate
Hollow-cathode oxygen plasma
Micro-grooving
Plasma etching

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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10.1016/j.mfglet.2016.05.001

Cite this

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title = "Micro-grooving into thick CVD diamond films via hollow-cathode oxygen plasma etching",

abstract = "Hollow-cathode oxygen plasma etching was proposed as a promising means to make micro-texturing into CVD diamond coatings. Oxygen ions and electrons were confined in the hollow-cathode to have higher ion and electron densities in the order of 1017 to 1018 m-3 in the inside of hollow-cathode. Quantitative plasma diagnosis proved that direct reaction of oxygen atom or radicals with carbon in the diamond coating should drive the reactive ion etching (RIE) process. A diamond-coated WC (Co) disc specimen was employed to describe the RIE-behavior with aid of stainless steel mask with the line width of 100 μm. Surface depth profile measurement as well as the Raman spectroscopy demonstrated that a micro-groove was precisely etched into the diamond film as a sharp-edged profile.",

keywords = "CVD diamond coating, High etching rate, Hollow-cathode oxygen plasma, Micro-grooving, Plasma etching",

author = "Yunata, {Ersyzario Edo} and Tatsuhiko Aizawa",

note = "Publisher Copyright: {\textcopyright} 2016 Society of Manufacturing Engineers (SME).",

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doi = "10.1016/j.mfglet.2016.05.001",

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T1 - Micro-grooving into thick CVD diamond films via hollow-cathode oxygen plasma etching

AU - Yunata, Ersyzario Edo

AU - Aizawa, Tatsuhiko

PY - 2016/4/1

Y1 - 2016/4/1

N2 - Hollow-cathode oxygen plasma etching was proposed as a promising means to make micro-texturing into CVD diamond coatings. Oxygen ions and electrons were confined in the hollow-cathode to have higher ion and electron densities in the order of 1017 to 1018 m-3 in the inside of hollow-cathode. Quantitative plasma diagnosis proved that direct reaction of oxygen atom or radicals with carbon in the diamond coating should drive the reactive ion etching (RIE) process. A diamond-coated WC (Co) disc specimen was employed to describe the RIE-behavior with aid of stainless steel mask with the line width of 100 μm. Surface depth profile measurement as well as the Raman spectroscopy demonstrated that a micro-groove was precisely etched into the diamond film as a sharp-edged profile.

AB - Hollow-cathode oxygen plasma etching was proposed as a promising means to make micro-texturing into CVD diamond coatings. Oxygen ions and electrons were confined in the hollow-cathode to have higher ion and electron densities in the order of 1017 to 1018 m-3 in the inside of hollow-cathode. Quantitative plasma diagnosis proved that direct reaction of oxygen atom or radicals with carbon in the diamond coating should drive the reactive ion etching (RIE) process. A diamond-coated WC (Co) disc specimen was employed to describe the RIE-behavior with aid of stainless steel mask with the line width of 100 μm. Surface depth profile measurement as well as the Raman spectroscopy demonstrated that a micro-groove was precisely etched into the diamond film as a sharp-edged profile.

KW - CVD diamond coating

KW - High etching rate

KW - Hollow-cathode oxygen plasma

KW - Micro-grooving

KW - Plasma etching

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JO - Manufacturing Letters

JF - Manufacturing Letters

ER -

Micro-grooving into thick CVD diamond films via hollow-cathode oxygen plasma etching

Abstract

Keywords

UN SDGs

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